TFT Laboratory is led by Prof. Si-Chen Lee. The research topics are mainly on the study of a-Si/poly-Si materials and thin film transistor (TFT) for use in Liquid-Crystal-Display (LCD) and Organic Light Emitting Display (OLED).

The emphases are on the stability of poly-Si TFT by deuterium passivation, enlarging the poly-Si grain size and uniformity by excimer laser annealing (ELA) and metal induced crystallization (MIC) of amorphous silicon.
The equipments are plasma enhanced chemical vapor deposition (PECVD), low pressure chemical vapor deposition (LPCVD), reactive ion etching (RIE), sputter and voltage-current measurement system.

     
 
     

1. We successfully fabricated the a-Si edge¡Borientation and angle detectors with signal processing capability. These detectors can directly detect the edge¡Borientation and angle of a feature in an image.

2. We successfully fabricated the a-SiGe X-ray photodetector which has a better photoresponse than that of a traditional a-Si detector.

3. We developed a low-temperature fabrication process of amorphous and poly silicon thin film transistor using liquid phase deposition of SiO2 as the gate oxide.

4. We substituted hydrogen with deuterium to fabricate amorphous and poly- silicon thin film transistors for the first time, which have better electrical performance and stability.

5. We discovered that the growth rate of Ni/Cu induced poly-Si is 10 times faster than the traditional Ni-induced process with comparable grain size. This leads to the potential industrial applications.

6. We improved the excimer laser annealing method to enlarge the poly-Si grain size to 10 £gm.

7. We successfully fabricated the SiGe quantum dot infrared photodetector (QDIP) by the combination of bottom-up and top-down technologies. The QDIP can be operated up to 240 K.

8. We successfully fabricated the near-room-temperature-operated (~250 K) InAs/(Al)GaAs quantum dot infrared photodetector which can lower the operation cost and widen the application areas.

9. We have successfully grow undoped and doped Si nanowires with 10, 20, and 50 nm in diameters by LPCVD and measure their structural, optical and electrical properties.

10. We developed a new AMOLED pixel that has a solar cell inserted between the driving TFT and the OLED pixel. Such an pixel structure not only improves the contrast of the AMOLED but is also capable of recycling part of the incident light and emitted photons by OLED.

11.We have successfully fabricated low temperature poly-silicon thin film transistors (LTPS TFTs) prepared by excimer laser annealing of hydrogenated amorphous silicon (a-Si:H) on polyimide with 370 cm2/V-sec field effect mobility.

12. By utilizing surface plasmon, the infrared thermal emitter with narrow bandwidth and tunable wavelength is developed successfully.

13. It is demonstrated that the cross shaped hole arrays exhibit more efficient transmittance of incident light than those of the square and rectangular hole arrays with the same area and lattice constant.

14. By applying the surface plasmon phenomenon to quantum dot infrared photodetector (QDIP), a wavelength selectable narrow bandwidth detector is fabricated successfully.


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